✦ LIBER ✦

[IEEE International Electron Devices Meeting - Washington, DC, USA (10-13 Dec. 1995)] Proceedings of International Electron Devices Meeting - The effect of source/drain processing on the reverse short channel effect of deep sub-micron bulk and SOI NMOSFETs

✍ Scribed by Crowder, S.W.; Rousseau, P.M.; Snyder, J.P.; Scott, J.A.; Griffin, P.B.; Plummer, J.D.

No coin nor oath required. For personal study only.

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