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[IEEE International Electron Devices Meeting. Technical Digest. IEDM - San Francisco, CA, USA (10-13 Dec. 2000)] International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138) - Impact of process scaling on 1/f noise in advanced CMOS technologies

✍ Scribed by Knitel, M.J.; Woerlee, P.H.; Scholten, A.J.; Zegers-Van Duijnhoven, A.

Book ID: 126171738
Publisher: IEEE
Year: 2000
Weight: 312 KB
Edition: 2000
Category: Article
ISBN-13: 9780780364387
DOI: 10.1109/IEDM.2000.904356

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