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[IEEE International Conference on Advanced Thermal Processing of Semiconductors - Charleston, NC, USA (23-26 Sept. 2003)] 11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003 - Reflectivity of the silicon semiconductor substrate and its dependence on the doping concentration and intensity of the irradiation

✍ Scribed by Lojek, B.

Book ID: 121002686
Publisher: IEEE
Year: 2003
Weight: 303 KB
Category: Article
ISBN-13: 9780780378742
DOI: 10.1109/RTP.2003.1249151

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