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[IEEE 2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) - Gainesville, FL, USA (2010.09.28-2010.10.1)] 2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) - Investigation of the temperature coefficient of electrical resistance and 1/f noise of laser-annealed amorphous silicon layers

✍ Scribed by Foerster, J.; Vogt, H.; Grabmaier, A.


Book ID
121649816
Publisher
IEEE
Year
2010
Weight
712 KB
Category
Article
ISBN
1424484006

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