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[IEEE IEEE International Electron Devices Meeting - San Francisco, CA, USA (8-11 Dec. 2002)] Digest. International Electron Devices Meeting, - A sub-400°C germanium MOSFET technology with high-κ dielectric and metal gate

✍ Scribed by Chi On Chui, ; Hyoungsub Kim, ; Chi, D.; Triplett, B.B.; McIntyre, P.C.; Saraswat, K.C.


Book ID
125886962
Publisher
IEEE
Year
2002
Weight
297 KB
Category
Article
ISBN-13
9780780374621

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