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[IEEE IEEE International Electron Devices Meeting 2003 - Washington, DC, USA (8-10 Dec. 2003)] IEEE International Electron Devices Meeting 2003 - A novel graded antireflective coating with built-in hardmask properties enabling 65nm and below CMOS device patterning

✍ Scribed by Babich, K.; Fukiage, N.; Mahorowala, A.; Halle, S.; Bunner, T.; Pfeiffer, D.; Mochiki, H.; Ashigaki, S.; Xia, A.; Angelopoulos, M.

Book ID: 124155944
Publisher: IEEE
Year: 2003
Weight: 248 KB
Edition: 1
Category: Article
ISBN-13: 9780780378728
DOI: 10.1109/IEDM.2003.1269369

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