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[IEEE Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004. - Honolulu, HI, USA (2004.06.17-2004.06.17)] Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004. - Dual work function metal gate CMOS using CVD metal electrodes

✍ Scribed by Narayanan, V.; Callegari, A.; McFeely, F.R.; Nakamura, K.; Jamison, P.; Zafar, S.; Cartier, E.; Steegen, A.; Ku, V.; Nguyen, P.; Milkove, K.; Cabral, C.; Gribelyuk, M.; Wajda, C.; Kawano, Y.; Lacey, D.; Li, Y.; Sikorski, E.; Duch, F.; Ng, H.; Wann, C.; Jammy, R.; Ieong, M.; Shahidi, G.

Book ID: 126630449
Publisher: IEEE
Year: 2004
Weight: 190 KB
Category: Article
ISBN-13: 9780780382893
DOI: 10.1109/VLSIT.2004.1345473

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