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[IEEE Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004. - Honolulu, HI, USA (2004.06.17-2004.06.17)] Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004. - Ultra-shallow junction formation by non-melt laser spike annealing for 50-nm gate CMOS

✍ Scribed by Shima, A.; Yun Wang, ; Talwar, S.; Hiraiwa, A.

Book ID: 126600005
Publisher: IEEE
Year: 2004
Weight: 201 KB
Category: Article
ISBN-13: 9780780382893
DOI: 10.1109/VLSIT.2004.1345463

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