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[IEEE Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004. - Honolulu, HI, USA (2004.06.17-2004.06.17)] Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004. - High quality high-k MIM capacitor by Ta/sub 2/O/sub 5//HfO/sub 2//Ta/sub 2/O/sub 5/ multi-layered dielectric and NH/sub 3/ plasma interface treatments for mixed-signal/RF applications

✍ Scribed by Yong-kuk Jeong, ; Seok-jun Won, ; Dae-jin Kwon, ; Min-woo Song, ; Weon-hong Kim, ; Moon-han Park, ; Joo-hyun Jeong, ; Han-su Oh, ; Ho-kyu Kang, ; Kwang-pyuk Suh,

Book ID: 125495003
Publisher: IEEE
Year: 2004
Weight: 182 KB
Category: Article
ISBN-13: 9780780382893
DOI: 10.1109/VLSIT.2004.1345491

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