[IEEE Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004. - Honolulu, HI, USA (2004.06.17-2004.06.17)] Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004. - Effects of barrier height (/spl Phi//sub B/) and the nature of bi-layer structure on the reliability of high-k dielectrics with dual metal gate (Ru & Ru-Ta alloy) technology

[IEEE Digest of Technical Papers. 2004 S

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[IEEE Digest of Technical Papers. 2004 S

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