𝔖 Bobbio Scriptorium

✦ LIBER ✦

[IEEE Digest of Papers Microprocesses and Nanotechnology 2005. 2005 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (2005.10.25-2005.10.28)] Digest of Papers Microprocesses and Nanotechnology 2005 - Fabrication of three-dimensional HSQ resist structure using electron beam lithography

✍ Scribed by Matsubara, Y.; Taniguchi, J.; Miyamoto, I.

Book ID: 118246482
Publisher: IEEE
Year: 2005
Tongue: Japanese
Weight: 802 KB
Volume: 0
Category: Article
ISBN-13: 9784990247225
DOI: 10.1109/imnc.2005.203777

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

[Japan Soc. Appl. Phys Digest of Papers

[Japan Soc. Appl. Phys Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (11-13 July 2000)] Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) - Quantum dots in carbon nanotubes

✍ Ishibashi, K.; Suzuki, M.; Ida, T.; Tsukagoshi, K.; Aoyagi, Y. 📂 Article 📅 2000 🏛 Japan Soc. Appl. Phys 🌐 Japanese ⚖ 92 KB

[Japan Soc. Appl. Phys Digest of Papers

[Japan Soc. Appl. Phys Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (11-13 July 2000)] Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) - RF-plasma assisted fast atom beam etching

✍ Ono, T.; Simizu, T.; Orimoto, N.; Lee, S.; Masayoshi, E. 📂 Article 📅 2000 🏛 Japan Soc. Appl. Phys 🌐 Japanese ⚖ 204 KB

[Japan Soc. of Appl. Phys Digest of Pape

[Japan Soc. of Appl. Phys Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (29-31 Oct. 2003)] Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference - 3D proximity effect correction for multi-layer structures in EB lithography

✍ Ogino, K.; Hoshino, H.; Machida, Y.; Osawa, M.; Arimoto, H.; Maruyama, T.; Kawam 📂 Article 📅 2003 🏛 Japan Soc. of Appl. Phys ⚖ 170 KB

[Japan Soc. Appl. Phys Digest of Papers.

[Japan Soc. Appl. Phys Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (6-8 Nov. 2002)] 2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. - Lithography process development for 20 nm MOSFET devices

✍ Mollard, L.; Dal'zotto, B.; Tedesco, S.; Bertrand, G. 📂 Article 📅 2002 🏛 Japan Soc. Appl. Phys 🌐 Japanese ⚖ 148 KB

[Japan Soc. Appl. Phys Digest of Papers.

[Japan Soc. Appl. Phys Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference - Shimane, Japan (31 Oct.-2 Nov. 2001)] Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) - Lens fabrication on optical fiber end using photolithography

✍ Sasaki, M.; Ando, T.; Nogawa, S.; Hane, K. 📂 Article 📅 2001 🏛 Japan Soc. Appl. Phys 🌐 Japanese ⚖ 246 KB

[Japan Soc. Appl. Phys Digest of Papers.

[Japan Soc. Appl. Phys Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (6-8 Nov. 2002)] 2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. - Fabrication of Fin-type double-gate MOSFET (FXMOS) structure by orientation-dependent etching and electron beam lithography

✍ Liu, Y.X.; Ishii, K.; Tsutsumi, T.; Masahara, M.; Takashima, H.; Suzuki, E. 📂 Article 📅 2002 🏛 Japan Soc. Appl. Phys 🌐 Japanese ⚖ 116 KB