[IEEE 2012 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu (2012.04.23-2012.04.25)] Proceedings of Technical Program of 2012 VLSI Technology, System and Application - A high density cylinder-type MIM capacitor integrated with advanced 28nm logic High-K/Metal-Gate process for embedded DRAM

✍ Scribed by Tu, K. C.; Wang, C. C.; Hsieh, Y. T.; Ting, Y. W.; Chang, C. Y.; Pai, C. Y.; Tzeng, K. C.; Chu, H. C.; Lin, H. L.; Chang, Y. W.; Pen, C. N.; Chen, K. W.; Hsieh, T. H.; Tsai, C. Y.; Huang, K. C.; Chiang, W. C.; Wang, M. J.; Wang, C. J.; Tsai, C. S.; Wuu, S. G.; Hwang, H. Y.; Tran, L. C.

• Book ID: 121850059
• Publisher: IEEE
• Year: 2012
• Weight: 334 KB
• Category: Article
• ISBN: 1457720825
• DOI: 10.1109/VLSI-TSA.2012.6210164