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[IEEE 2012 IEEE Symposium on VLSI Technology - Honolulu, HI, USA (2012.06.12-2012.06.14)] 2012 Symposium on VLSI Technology (VLSIT) - The understanding of the trap induced variation in bulk tri-gate devices by a novel random trap profiling (RTP) technique

✍ Scribed by Tsai, H. M.; Hsieh, E. R.; Chung, Steve S.; Tsai, C. H.; Huang, R. M.; Tsai, C. T.; Liang, C. W.

No coin nor oath required. For personal study only.

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