𝔖 Bobbio Scriptorium

✦ LIBER ✦

[IEEE 2011 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu, Taiwan (2011.04.25-2011.04.27)] Proceedings of 2011 International Symposium on VLSI Technology, Systems and Applications - New Tellurium implant and segregation for contact resistance reduction and single metallic silicide technology for independent contact resistance optimization in n- and p-FinFETs

✍ Scribed by Koh, Shao-Ming; Kong, Eugene Yu Jin; Liu, Bin; Ng, Chee-Mang; Liu, Pan; Mo, Zhi-Qiang; Leong, Kam-Chew; Samudra, Ganesh S.; Yeo, Yee-Chia

Book ID: 126635589
Publisher: IEEE
Year: 2011
Weight: 355 KB
Category: Article
ISBN: 1424484936
DOI: 10.1109/VTSA.2011.5872238

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

[IEEE 2011 International Symposium on VL

[IEEE 2011 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu, Taiwan (2011.04.25-2011.04.27)] Proceedings of 2011 International Symposium on VLSI Technology, Systems and Applications - Graphene transistors 2011

✍ Schwierz, Frank 📂 Article 📅 2011 🏛 IEEE ⚖ 235 KB

[IEEE 2011 International Symposium on VL

[IEEE 2011 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu, Taiwan (2011.04.25-2011.04.27)] Proceedings of 2011 International Symposium on VLSI Technology, Systems and Applications - High temperature millisecond silicide anneal for contact resistivity −8 Ωcm2

✍ Loh, W.-Y; Yang, Y. R.; Hung, P. Y.; Sassman, B.; Kenney, C.; Bersuker, G.; Majh 📂 Article 📅 2011 🏛 IEEE ⚖ 558 KB

[IEEE 2011 International Symposium on VL

[IEEE 2011 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu, Taiwan (2011.04.25-2011.04.27)] Proceedings of 2011 International Symposium on VLSI Technology, Systems and Applications - Smart Power technologies on SOI

✍ Wessels, Piet 📂 Article 📅 2011 🏛 IEEE ⚖ 298 KB

[IEEE 2011 International Symposium on VL

[IEEE 2011 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu, Taiwan (2011.04.25-2011.04.27)] Proceedings of 2011 International Symposium on VLSI Technology, Systems and Applications - Carbon nanotubes for VLSI: Interconnect and transistor applications

✍ Awano, Y.; Sato, S.; Nihei, M.; Sakai, T.; Ohno, Y.; Mizutani, T. 📂 Article 📅 2011 🏛 IEEE ⚖ 505 KB

[IEEE 2011 International Symposium on VL

[IEEE 2011 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu, Taiwan (2011.04.25-2011.04.27)] Proceedings of 2011 International Symposium on VLSI Technology, Systems and Applications - Disturb-free Independently-controlled-Gate 7T FinFET SRAM cell

✍ Chen, Yin-Nien; Hsieh, Chien-Yu; Fan, Ming-Long; Hu, Vita Pi-Ho; Su, Pin; Chuang 📂 Article 📅 2011 🏛 IEEE ⚖ 545 KB

[IEEE 2011 International Symposium on VL

[IEEE 2011 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu, Taiwan (2011.04.25-2011.04.27)] Proceedings of 2011 International Symposium on VLSI Technology, Systems and Applications - Copper interconnect technology for the 22 nm node

✍ Gambino, J. P. 📂 Article 📅 2011 🏛 IEEE ⚖ 102 KB