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[IEEE 2011 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu, Taiwan (2011.04.25-2011.04.27)] Proceedings of 2011 International Symposium on VLSI Technology, Systems and Applications - CMOS scaling for the 22nm node and beyond: Device physics and technology

✍ Scribed by Kuhn, Kelin J.

Book ID: 120177816
Publisher: IEEE
Year: 2011
Weight: 734 KB
Category: Article
ISBN: 1424484936
DOI: 10.1109/VTSA.2011.5872206

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