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[IEEE 2010 IEEE International Integrated Reliability Workshop (IIRW) - S. Lake Tahoe, CA, USA (2010.10.17-2010.10.21)] 2010 IEEE International Integrated Reliability Workshop Final Report - Defects in low-κ dielectrics and etch stop layers for use as interlayer dielectrics in ULSI

✍ Scribed by Bittel, B.C.; Pomorski, T.A.; Lenahan, P.M.; King, S.

Book ID: 126642375
Publisher: IEEE
Year: 2010
Weight: 369 KB
Category: Article
ISBN: 1424485215
DOI: 10.1109/IIRW.2010.5706482

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