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[IEEE 2008 IEEE International Integrated Reliability Workshop Final Report (IRW) - South lake Tahoe, CA, USA (2008.10.12-2008.10.16)] 2008 IEEE International Integrated Reliability Workshop Final Report - Copper line topology impact of SiOCH low-k dielectric reliability in advanced 45nm technology node and beyond

โœ Scribed by Vilmay, M.; Roy, D.; Monget, C.; Volpi, F.; Chaix, J-M.


Book ID
126761628
Publisher
IEEE
Year
2008
Weight
629 KB
Category
Article
ISBN
1424421942

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