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[IEEE 2009 17th International Conference on Advanced Thermal Processing of Semiconductors (RTP) - Albany, NY, USA (2009.09.29-2009.10.2)] 2009 17th International Conference on Advanced Thermal Processing of Semiconductors - Homogeneity check of ion implantation in silicon by wide-angle ellipsometry

✍ Scribed by Fried, M.; Juhasz, G.; Major, C.; Petrik, P.; Battistig, G.

Book ID: 126697064
Publisher: IEEE
Year: 2009
Weight: 829 KB
Category: Article
ISBN: 1424438144
DOI: 10.1109/RTP.2009.5373448

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