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[IEEE 2003 International Symposium on VLSI Technology, Systems and Applications. Technical Papers - Hsinchu, Taiwan (6-8 Oct. 2003)] 2003 International Symposium on VLSI Technology, Systems and Applications. Proceedings of Technical Papers. (IEEE Cat. No.03TH8672) - New technologies in isolation and capacitor process for sub 0.1μm DRAM

✍ Scribed by U-In Chung, ; Cha-Young Yoo, ; Soo-Jin Hong,

Book ID: 126626042
Publisher: IEEE
Year: 2003
Weight: 228 KB
Category: Article
ISBN-13: 9780780377653
DOI: 10.1109/VTSA.2003.1252540

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