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[IEEE 2003 International Symposium on VLSI Technology, Systems and Applications. Proceedings of Technical Papers - Hsinchu, Taiwan (6-8 Oct. 2003)] 2003 International Symposium on VLSI Technology, Systems and Applications. Proceedings of Technical Papers. (IEEE Cat. No.03TH8672) - On the retention time distribution of dual-channel vertical DRAM technologies

✍ Scribed by Beintner, J.; Li, Y.; Casarotto, D.; Chidambarrao, D.; McStay, K.; Wang, G.; Hummler, K.; Divakaruni, R.; Bergner, W.; Crabbe, E.; Mueller, W.; Poechmueller, P.; Bronner, G.

Book ID: 126639931
Publisher: IEEE
Year: 2003
Weight: 257 KB
Category: Article
ISBN-13: 9780780377653
DOI: 10.1109/VTSA.2003.1252598

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