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[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Activation and deactivation studies of laser thermal annealed boron, arsenic, phosphorus, and antimony ultra-shallow abrupt junctions

✍ Scribed by Murto, R.; Jones, K.; Rendon, M.; Talwar, S.

Book ID: 120883625
Publisher: Ieee
Year: 2000
Tongue: English
Weight: 366 KB
Edition: 2000
Category: Article
ISBN-13: 9780780364622
DOI: 10.1109/.2000.924113

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