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Hydrogenated amorphous carbon thin films deposited by plasma-assisted chemical vapor deposition enhanced by electrostatic confinement: structure, properties, and modeling

✍ Scribed by Dufrène, S. M. M.; Cemin, F.; Soares, M. R. F.; Aguzzoli, C.; Maia da Costa, M. E. H.; Baumvol, I. J. R.; Figueroa, C. A.

No coin nor oath required. For personal study only.

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