Using the parylene polymer platform, benzylic brominated poly(trifluoroacetyl-p-xylylene) thin films are deposited at room temperature from a novel synthesized precursor, 2-trifluoroacetyl-a,a,aβ² tribromo-p-xylene using CVD. The as-deposited benzylic brominated parylene-type polymer is nearly transp
β¦ LIBER β¦
Homogeneous chemical vapor deposition of amorphous semiconductor thin films
β Scribed by B.A. Scott; W.L. Olbricht; J.A. Reimer; B.S. Meyerson; D.J. Wolford
- Book ID
- 118332041
- Publisher
- Elsevier Science
- Year
- 1983
- Tongue
- English
- Weight
- 266 KB
- Volume
- 59-60
- Category
- Article
- ISSN
- 0022-3093
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## Abstract Atmospheric pressure chemical vapor deposition (APCVD) of niobium sulfide coatings was achieved on glass substrates from the reaction of NbCl~5~ and S(SiMe~3~)~2~, __t__Bu~2~S~2~, __t__BuSH, or HSCH~2~CH~2~SH at 250β600 Β°C. The niobium sulfide films grown at temperatures above 500 Β°C we