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Chemical vapor deposition of thin semiconductor films for solar energy conversion

✍ Scribed by B.O. Seraphin

Publisher
Elsevier Science
Year
1976
Tongue
English
Weight
669 KB
Volume
39
Category
Article
ISSN
0040-6090

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Chemical Vapor Deposition of Niobium Dis
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## Abstract Atmospheric pressure chemical vapor deposition (APCVD) of niobium sulfide coatings was achieved on glass substrates from the reaction of NbCl~5~ and S(SiMe~3~)~2~, __t__Bu~2~S~2~, __t__BuSH, or HSCH~2~CH~2~SH at 250βˆ’600 Β°C. The niobium sulfide films grown at temperatures above 500 Β°C we