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Homoepitaxial growth of GaN using molecular beam epitaxy

✍ Scribed by Gassmann, A.; Suski, T.; Newman, N.; Kisielowski, C.; Jones, E.; Weber, E. R.; Liliental‐Weber, Z.; Rubin, M. D.; Helava, H. I.; Grzegory, I.; Bockowski, M.; Jun, J.; Porowski, S.


Book ID
118122014
Publisher
American Institute of Physics
Year
1996
Tongue
English
Weight
419 KB
Volume
80
Category
Article
ISSN
0021-8979

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GaN films are grown by plasma-assisted molecular beam epitaxy on 6H-SiC(0001) substrates. Suitable substrate preparation and growth conditions are found which greatly improve the structural quality of the films. Threading dislocation densities of about 1 Â 10 9 cm --2 for edge dislocations and 1 Â 1