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Homoepitaxial Growth and Luminescence Characterization of GaN Epilayer by RF-MBE on MOCVD-Grown GaN Substrate

โœ Scribed by Kurai, S. ;Kubo, S. ;Okazaki, T. ;Manabe, S. ;Sugita, T. ;Kawabe, A. ;Yamada, Y. ;Taguchi, T.


Publisher
John Wiley and Sons
Year
1999
Tongue
English
Weight
159 KB
Volume
176
Category
Article
ISSN
0031-8965

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MOCVD Growth and Characterization of GaN
โœ Zhang, X. ;Chua, S. J. ;Feng, Z. C. ;Chen, J. ;Lin, J. ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 169 KB ๐Ÿ‘ 2 views

GaN thin films have been grown on Si(001) substrate with specially designed composite intermediate layers (CIL) consisting of an ultrathin amorphous silicon layer and a GaN/Al x Ga 1ยฑ ยฑx N multilayered buffer by low pressure metal-organic chemical vapor deposition (MOCVD). The improved film quality