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High-Temperature Growth of GaN and AlxGa1−xN via Ammonia-Based Metalorganic Molecular-Beam Epitaxy

✍ Scribed by Daniel Billingsley; Walter Henderson; W. Alan Doolittle


Book ID
107455795
Publisher
Springer US
Year
2010
Tongue
English
Weight
449 KB
Volume
39
Category
Article
ISSN
0361-5235

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## Abstract We report on the self organized growth of GaN quantum dots deposited on Al~__x__~ Ga~1–__x__~ N layer by plasma‐assisted molecular beam epitaxy. It is found that the relaxation of Al~__x__~ Ga~1–__x__~ N layer on AlN depends on Al composition and thickness. The measurement of the variat