a), T. Tanabe (a), S. Kubo (a), S. Kurai (a), T. Taguchi (a), K. Kainosho (b), and A. Yokohata (b)
The growth and rare-earth doping of GaN quantum dots on AlxGa1-xN layer by plasma-assisted molecular beam epitaxy
β Scribed by Hori, Y. ;Andreev, T. ;Bellet-Amalric, E. ;Oda, O. ;Le Si Dang, D. ;Daudin, B.
- Publisher
- John Wiley and Sons
- Year
- 2007
- Tongue
- English
- Weight
- 141 KB
- Volume
- 204
- Category
- Article
- ISSN
- 0031-8965
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β¦ Synopsis
Abstract
We report on the self organized growth of GaN quantum dots deposited on Al~x~ Ga~1βx~ N layer by plasmaβassisted molecular beam epitaxy. It is found that the relaxation of Al~x~ Ga~1βx~ N layer on AlN depends on Al composition and thickness. The measurement of the variation of lattice parameter indicated that GaN quantum dots do not relax completely on Al~x~ Ga~1βx~ N layer. Optical properties of undoped and Euβdoped quantum dots on AlGaN layer were studied. Visible light emission from Eu^3+^ ions has been observed and showed strong thermal stability. (Β© 2007 WILEYβVCH Verlag GmbH & Co. KGaA, Weinheim)
π SIMILAR VOLUMES
InGaN/GaN multiple quantum-wells (MQWs) on Ga-polarity GaN by plasma-assisted molecularbeam epitaxy were grown and characterized. In-situ reflection high-energy-electron diffraction observations and high-resolution X-ray diffraction results indicated that a flat interface and a good periodicity of t