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High-resolution sputter depth profiling with a low pressure hf plasma

✍ Scribed by Stumpe, E. ;Oechsner, H. ;Schoof, H.

Publisher: Springer
Year: 1979
Tongue: English
Weight: 642 KB
Volume: 20
Category: Article
ISSN: 1432-0630
DOI: 10.1007/bf00901787

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