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The computer modelling of SIMS sputter depth profiling and high fluence, low energy ion implantation using the IMPETUS code: J A van den Berg∗, D G Armour∗, R Badhekau†, M Wadsworth‡ and C R Whitehouse,‡∗Department of Electronic and Electrical Engineering, † Department of Mathematics and Computer Science, University of Salford, Salford M5 4WT, UK, ‡ RSRE, Malvern, Worcs WR14 3 PS, UK


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
133 KB
Volume
39
Category
Article
ISSN
0042-207X

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