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High quality a-Si:H films and interfaces prepared by VHF plasma CVD

✍ Scribed by Shunri Oda; Masahiro Yasukawa

Book ID
117147085
Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
237 KB
Volume
137-138
Category
Article
ISSN
0022-3093

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High-photosensitivity a-SiGe: H films pr
High-photosensitivity a-SiGe: H films prepared by RF glow discharge plasma CVD method
✍ Fangqing Zhang; Zhizhong Song; Yongping Guo; Guanghua Chen πŸ“‚ Article πŸ“… 1993 πŸ› Elsevier Science 🌐 English βš– 247 KB

Highly photosensitive and narrow band gap a-SiGe:H films have been prepared by the RF glow discharge plasma CVD method. The photosensitivity was 2.01 Γ— 10 s for the film with an optical band gap of Eg = 1.47 eV. H 2 dilution and a relatively high RF power are attributed to the improving of the optoe