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High-Power Pulsed Magnetron Sputtering Glow Plasma in Argon Gas and Pulsed Ion Extraction

✍ Scribed by Jing, Fengjuan; Yukimura, Ken; Hara, Shiro; Nakano, Shizuka; Ogiso, Hisato; Huang, Nan

Book ID: 121753774
Publisher: IEEE
Year: 2010
Tongue: English
Weight: 630 KB
Volume: 38
Category: Article
ISSN: 0093-3813
DOI: 10.1109/TPS.2010.2066581

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## Abstract A droplet free metallic plasma source is promising for enhanced adhesion of films with a smooth coating surface. This paper concerns a highly ionized metallic plasma source using a pulsed Penning discharge. A high‐power pulsed sputtering (HPPS) glow discharge plasma is generated using e