High-power gas-discharge EUV source
✍ Scribed by V. M. Borisov; A. Yu. Vinokhodov; A. S. Ivanov; Yu. B. Kiryukhin; S. V. Mironov; V. A. Mishchenko; A. V. Prokof’ev; O. B. Khristoforov
- Book ID
- 110132575
- Publisher
- SP MAIK Nauka/Interperiodica
- Year
- 2002
- Tongue
- English
- Weight
- 65 KB
- Volume
- 28
- Category
- Article
- ISSN
- 1063-780X
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A new high repetitive, compact and low cost gas discharge based EUV ,,lamp" has been studied as an alternative to laser-produced plasmas as EUV sources. First results using oxygen in a fast discharge of electrically stored energy around 1 J lead to a conversion efficiency of about 0.1% for the emiss
Pulsed plasmas, e.g., laser produced plasma (LPP) and gas discharge based pinch plasmas are known as intense sources of soft x-ray and extreme ultraviolet (EUV) radiation in the wavelength interval of about 1 um to beyond 50 nm. They can be generated in compact, laboratory scale devices. Both scheme