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High-performance amorphous gallium indium zinc oxide thin-film transistors through N[sub 2]O plasma passivation

✍ Scribed by Park, Jaechul; Kim, Sangwook; Kim, Changjung; Kim, Sunil; Song, Ihun; Yin, Huaxiang; Kim, Kyoung-Kok; Lee, Sunghoon; Hong, Kiha; Lee, Jaecheol; Jung, Jaekwan; Lee, Eunha; Kwon, Kee-Won; Park, Youngsoo

Book ID: 126063599
Publisher: American Institute of Physics
Year: 2008
Tongue: English
Weight: 561 KB
Volume: 93
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.2962985

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