N2O plasma treatment suppressed temperature-dependent sub-threshold leakage current of amorphous indium–gallium–zinc-oxide thin film transistors

✍ Scribed by Chang, Geng-Wei; Chang, Ting-Chang; Jhu, Jhe-Ciou; Tsai, Tsung-Ming; Syu, Yong-En; Chang, Kuan-Chang; Jian, Fu-Yen; Hung, Ya-Chi; Tai, Ya-Hsiang

• Book ID: 121789936
• Publisher: Elsevier Science
• Year: 2013
• Tongue: English
• Weight: 706 KB
• Volume: 231
• Category: Article
• ISSN: 0257-8972
• DOI: 10.1016/j.surfcoat.2012.04.086