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High-k (k=30) amorphous hafnium oxide films from high rate room temperature deposition

✍ Scribed by Li, Flora M.; Bayer, Bernhard C.; Hofmann, Stephan; Dutson, James D.; Wakeham, Steve J.; Thwaites, Mike J.; Milne, William I.; Flewitt, Andrew J.

Book ID: 120379140
Publisher: American Institute of Physics
Year: 2011
Tongue: English
Weight: 620 KB
Volume: 98
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.3601487

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