High-Quality Nitrogen-Doped Fluorinated Silicon Oxide Films Prepared by Temperature-Difference-Based Liquid-Phase Deposition

✍ Scribed by Lee, M. K.; Shieh, W. H.; Shih, C. M.; Tung, K. W.

• Book ID: 125996159
• Publisher: American Chemical Society
• Year: 2003
• Tongue: English
• Weight: 111 KB
• Volume: 107
• Category: Article
• ISSN: 0022-3654
• DOI: 10.1021/jp030338q