High-fluence Co implantation in Si, SiO2/Si and Si3N4/Si: Part I: formation of thin silicide surface films

✍ Scribed by Yanwen Zhang; Thomas Winzell; Tonghe Zhang; Margaretha Andersson; Ivan A Maximov; Eva-Lena Sarwe; Mariusz Graczyk; Lars Montelius; Harry J Whitlow

• Book ID: 114171591
• Publisher: Elsevier Science
• Year: 1999
• Tongue: English
• Weight: 488 KB
• Volume: 159
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/s0168-583x(99)00550-9