Annealing behaviour of foreign atom incorporated Co-silicides formed by MEVVA implantation into SiO2/Si and Si3N4/Si structures

✍ Scribed by Yanwen Zhang; Tonghe Zhang; Dian-Tong Lu; Ivan A. Maximov; Eva-Lena Sarwe; Mariusz Graczyk; Harry J. Whitlow

• Book ID: 114164589
• Publisher: Elsevier Science
• Year: 2001
• Tongue: English
• Weight: 438 KB
• Volume: 175-177
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/s0168-583x(00)00658-3