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High field stressing effects on the split N2O grown thin gate dielectric by rapid thermal processing

โœ Scribed by Subrahmanyam, P.V.S.; Prabhakar, A.; Vasi, J.


Book ID
114536711
Publisher
IEEE
Year
1997
Tongue
English
Weight
74 KB
Volume
44
Category
Article
ISSN
0018-9383

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