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High Device Yield of Resistive Switching Characteristics in Oxygen-Annealed Memory Devices

✍ Scribed by Meng-Han Lin; Ming-Chi Wu; Yi-Han Huang; Chen-Hsi Lin; Tseung-Yuen Tseng


Book ID
114620365
Publisher
IEEE
Year
2011
Tongue
English
Weight
990 KB
Volume
58
Category
Article
ISSN
0018-9383

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## Abstract We successfully fabricated perovskite oxide‐based resistance random access memory (RRAM) with improved resistance switching characteristics, at a low temperature. A high‐pressure oxygen‐annealed (HPOA) W/Al/Pr~0.7~Ca~0.3~MnO~3~ (PCMO)/Pt device shows good memory characteristics such as