InGaN/GaN double heterojunction bipolar Npn transistors have been fabricated using p-type InGaN and n-type GaN as base and collector layers, respectively. The structures were grown on SiC substrates by low-pressure metalorganic vapor phase epitaxy. The In mole fraction in the base layer and its thic
β¦ LIBER β¦
High-Current-Gain Direct-Growth GaN/InGaN Double Heterojunction Bipolar Transistors
β Scribed by Yi-Che Lee; Yun Zhang; Hee-Jin Kim; Suk Choi; Lochner, Z.; Dupuis, R.D.; Jae-Hyun Ryou; Shyh-Chiang Shen
- Book ID
- 114620152
- Publisher
- IEEE
- Year
- 2010
- Tongue
- English
- Weight
- 569 KB
- Volume
- 57
- Category
- Article
- ISSN
- 0018-9383
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