N-AlGaN/p-InGaN/n-GaN Heterojunction Bipolar Transistors for High Power Operation
β Scribed by T. Makimoto; K. Kumakura; N. Kobayashi
- Publisher
- John Wiley and Sons
- Year
- 2003
- Tongue
- English
- Weight
- 113 KB
- Volume
- 0
- Category
- Article
- ISSN
- 1862-6351
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π SIMILAR VOLUMES
InGaN/GaN double heterojunction bipolar Npn transistors have been fabricated using p-type InGaN and n-type GaN as base and collector layers, respectively. The structures were grown on SiC substrates by low-pressure metalorganic vapor phase epitaxy. The In mole fraction in the base layer and its thic
## Abstract We report ultraβhighβpower performance on __npn__ GaN/InGaN double heterojunction bipolar transistors (DHBTs) that is directly grown on a freeβstanding (FS) GaN substrate. Measured commonβemitter current gain (__h__~fe~) reaches 80. A quasiβstatic __I__β__V__ measurement shows that __J_