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Healing of Structural Defects in the Topmost Layer of Graphite by Chemical Vapor Deposition

✍ Scribed by Iskandar N. Kholmanov; Jonathan Edgeworth; Emanuele Cavaliere; Luca Gavioli; Carl Magnuson; Rodney S. Ruoff


Publisher
John Wiley and Sons
Year
2011
Tongue
English
Weight
252 KB
Volume
23
Category
Article
ISSN
0935-9648

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A silicon nitride Ðlm was deposited on an Si(100) substrate with a silicon dioxide surface layer from and NH 3 by low-pressure chemical vapour deposition under various conditions. The etching rates of the silicon SiH 2 Cl 2 nitride Ðlms by bu †ered hydroΓ‘uoric acid (BHF) were investigated using Ruth