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Growth of Si1−yCy/Si- and Si1−x−yGexCy/Si-multiple quantum wells using molecular beam epitaxy

✍ Scribed by R. Hartmann; D. Grützmacher; E. Müller; U. Gennser; A. Dommann; P. Schröter; P. Warren

No coin nor oath required. For personal study only.

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