Growth of epitaxial nickel disilicide during rapid thermal processing of argon-implanted nickel films on silicon

✍ Scribed by Tokarev, V. V. ;Borisenko, V. E. ;Demchenko, A. I. ;Pyatkova, T. M.

• Publisher: John Wiley and Sons
• Year: 1989
• Tongue: English
• Weight: 450 KB
• Volume: 116
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/pssa.2211160130