The effect of oxygen impurity on growth of molybdenum disilicide and its distribution during rapid thermal annealing of co-sputtered MoSix thin films

✍ Scribed by R.S. Rastogi; V.D. Vankar; K.L. Chopra

• Publisher: Elsevier Science
• Year: 1992
• Tongue: English
• Weight: 976 KB
• Volume: 213
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(92)90473-o