GaN films are grown by plasma-assisted molecular beam epitaxy on 6H-SiC(0001) substrates. Suitable substrate preparation and growth conditions are found which greatly improve the structural quality of the films. Threading dislocation densities of about 1 Γ 10 9 cm --2 for edge dislocations and 1 Γ 1
β¦ LIBER β¦
Growth mode and strain evolution during InN growth on GaN(0001) by molecular-beam epitaxy
β Scribed by Ng, Y. F.; Cao, Y. G.; Xie, M. H.; Wang, X. L.; Tong, S. Y.
- Book ID
- 121791843
- Publisher
- American Institute of Physics
- Year
- 2002
- Tongue
- English
- Weight
- 343 KB
- Volume
- 81
- Category
- Article
- ISSN
- 0003-6951
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## Abstract The surface kinetics of InN growth on GaN(0001) by plasma assisted molecular beam epitaxy was investigated. The surface coverage of the GaN(0001) surface by InN islands and the corresponding islands' growth rate along the [0001] direction, were studied as a function of substrate tempera
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