Superconductor MgB 2 thin films with thickness 200 nm were prepared on sapphire substrates by co-deposition of boron and magnesium. Precursor MgB thin films were deposited from two independent magnetron sources-boron by rf magnetron sputtering and magnesium by dc magnetron sputtering. MgB precursor
Growth mechanism of superconducting MgB2 films prepared by various methods
β Scribed by Zhai, H. Y.; Christen, H. M.; Zhang, L.; Paranthaman, M.; Cantoni, C.; Sales, B. C.; Fleming, P. H.; Christen, D. K.; Lowndes, D. H.
- Book ID
- 118023399
- Publisher
- Cambridge University Press
- Year
- 2001
- Tongue
- English
- Weight
- 227 KB
- Volume
- 16
- Category
- Article
- ISSN
- 0884-2914
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An improved hybrid physical chemical vapor deposition (HPCVD) method for the preparation of magnesium diboride (MgB 2 ) films is proposed. In this experiment, the temperature for the evaporation of magnesium is set to be $700 Β°C, while the substrate is kept below 500 Β°C. Inside the vacuum chamber, d
As-grown superconducting MgB 2 thin films were prepared by very simple RF sputtering method using a single target without post-annealing process. A two-component target comprising of many small chunks of B on a Mg disk was used. The films were deposited onto polished single crystal sapphire (R-plane