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In-situ growth of superconducting MgB2 thin films by HPCVD method at low temperature

✍ Scribed by J. Yang; S. Wang; F.S. Yang; Z.P. Zhang; Z. Ding; X.H. Fu

Publisher: Elsevier Science
Year: 2007
Tongue: English
Weight: 404 KB
Volume: 467
Category: Article
ISSN: 0921-4534
DOI: 10.1016/j.physc.2007.06.001

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✦ Synopsis

An improved hybrid physical chemical vapor deposition (HPCVD) method for the preparation of magnesium diboride (MgB 2 ) films is proposed. In this experiment, the temperature for the evaporation of magnesium is set to be $700 °C, while the substrate is kept below 500 °C. Inside the vacuum chamber, double heaters control the temperature for the evaporation of Mg and of the substrate independently. The deposition of MgB 2 films on a polycrystalline Al 2 O 3 substrates is obtained by the reaction between evaporated magnesium atoms and boron atoms that decompose from diborane near the heaters. The superconducting MgB 2 films show a transition temperature at 38.5 K and a zero-resistance temperature at 38 K. The critical current density of the films is 10 5 A/cm 2 .

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